What Are the Steps of the Sputtering Process?

Feb. 24, 2025

What Are the Steps of the Sputtering Process?

​Sputtering silicon is a process where a thin film of silicon is deposited onto a substrate by bombarding a solid silicon target with energetic ions, typically from an inert gas like argon, causing the silicon atoms to be ejected from the target and condense onto the substrate, creating a thin silicon film; essentially, it's a physical vapor depo

  • Remarkable Benefits of Titanium-Silicon Sputtering Targets

    Feb. 24, 2025

    Remarkable Benefits of Titanium-Silicon Sputtering Targets

    In the ever-evolving world of thin-film deposition, Titanium-Silicon (Ti-Si) sputtering targets have emerged as a critical material for industries such as semiconductors, optics, and protective coatings. These advanced targets offer a unique combination of properties that enhance film performance, making them highly sought after in high-tech applic

  • High-Purity Sputtering Targets: Applications and Innovations Across Industries

    Jan. 22, 2025

    High-Purity Sputtering Targets: Applications and Innovations Across Industries

    ​Sputtering targets are essential materials in the physical vapor deposition (PVD) process, widely used to produce electronic thin films. High-purity sputtering targets, including aluminum (Al), titanium (Ti), tantalum (Ta), tungsten-titanium (W-Ti), and silicon (Si), are crucial in manufacturing large-scale integrated circuit chips, liquid cryst

  • How to Choose Titanium-Silicon Sputtering Targets

    Jan. 22, 2025

    How to Choose Titanium-Silicon Sputtering Targets

    ​Titanium-Silicon (Ti-Si) sputtering targets are essential materials in various industries, including semiconductor manufacturing, thin-film coatings, and advanced optics. These materials combine the unique properties of titanium and silicon, enabling high-performance thin films with exceptional durability, corrosion resistance, and thermal stabi

  • How CrAl Targets Improve Milling Machine Performance

    Dec. 27, 2024

    How CrAl Targets Improve Milling Machine Performance

    ​In the world of advanced machining, the need for enhanced performance and precision is constant. Milling machines, integral to various industries such as aerospace, automotive, and manufacturing, require top-notch components to ensure high efficiency and durability. One such innovation that has gained popularity in recent years is the use of Chr

  • Benefits of Chromium-Aluminum (CrAl) Targets for Tool Coating

    Dec. 13, 2024

    Benefits of Chromium-Aluminum (CrAl) Targets for Tool Coating

    Chromium-aluminum (CrAl) sputtering targets have emerged as a critical material in enhancing the performance and durability of various tools. Thanks to their toughness, thermal stability, and resistance to oxidation, CrAl coatings are widely used in milling machines, drills, and other industrial tools. This article explores the key benefits of usin

  • Proper Storage of Chromium Sputtering Targets

    Nov. 28, 2024

    Proper Storage of Chromium Sputtering Targets

    ​Chromium sputtering targets are commonly used in thin-film deposition processes, particularly in the production of coatings for Scanning Electron Microscope (SEM) samples. However, due to chromium’s reactive nature, its storage requires careful attention to avoid oxidation and maintain the integrity of the material. This article outlines the b

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