WC Sputtering Targets
A Tungsten Carbide Sputtering Target is a high-performance material commonly used in thin-film deposition processes, particularly in physical vapor deposition (PVD) applications. These sputtering targets are composed of tungsten carbide (WC), a dense and hard ceramic compound known for its excellent properties. Tungsten carbide is a compound composed of tungsten and carbon. Its molecular formula is WC and its molecular weight is 195.85.
DESCRIPTION
Tungsten carbide is a compound composed of tungsten and carbon. Its molecular formula is WC and its molecular weight is 195.85. It is a black hexagonal crystal with metallic luster and similar hardness to diamond. It is a good conductor of electricity and heat. Tungsten carbide is insoluble in water, hydrochloric acid and sulfuric acid, but easily soluble in the mixed acid of nitric acid and hydrofluoric acid. Pure tungsten carbide is fragile, if a small amount of titanium, cobalt and other metals are added, the brittleness can be reduced. Tungsten carbide, which is used as steel cutting tool, is often added with titanium carbide, tantalum carbide or their mixture to improve the antiknock ability. The chemical properties of WC are stable. Tungsten carbide powder is used in cemented carbide production.
| Typical Properties | Data | unit |
| WC | 95±0.3 | wt% |
| Co | 5±0.3 | wt% |
| Fe | <1000 | ppm |
| Si | <1000 | ppm |
| Hardness | 91.0±1 | HRA |
| Transverse rupture | 3000.00 | N/mm2 |
| Fracture toughness | 12.50 | MNm-3/2 |
| Grain s1ze | 1.0-3.0 | x10-6/C |
RELATED PRODUCTS
Advanced Targets also serve many customers who utilize evaporation techniques to deposit thin films.
Advanced Targets also serve many customers who utilize evaporation techniques to deposit thin films.
Tungsten carbide is a compound composed of tungsten and carbon. Its molecular formula is WC and its molecular weight is 195.85.
Tantalum(Ta) is one of the rare, hard, blue gray, and highly corrosion-resistant refractory metals. The melting point of tantalum is 2980 ℃, and the density is 16.68g/cm³.
Molybdenum Alloy Sputtering Targets
Because molybdenum(Mo) alloy has higher recrystallization temperature, better creep resistance, higher ductility, higher weldability and better resistance to oxidation than the pure molybdenum, molybdenum-based alloy targets are more widely used in high-temperature applications
