Ceramic Sputtering Targets

Ceramic sputtering targets are designed to deliver superior performance in thin-film deposition, offering exceptional hardness, wear resistance, and uniformity. These targets are perfect for specialized applications such as optics, semiconductors, and decorative coatings. Ceramic materials like titanium nitride (TiN), zirconium oxide (ZrO2), and aluminum oxide (Al2O3) provide outstanding thermal and electrical properties, making them ideal for high-precision coatings that require specific characteristics. Ceramic sputtering targets are known for their durability and consistency, ensuring that thin films are deposited with high uniformity and minimal defects. These targets are widely used in industries that demand high-performance coatings for applications such as medical devices, optical coatings, and industrial tools.

Zirconium Sputtering Targets

Zirconium sputtering targets are essential materials for the thin film deposition industry and are primarily used in the Physical Vapor Deposition (PVD) process.

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Titanium Aluminum Silicon

Other products with different proportion of ingredients can be customized

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Titanium Sputtering Targets

Improve wear resistance, reduce friction coefficient and prevent adhesion. It is a kind of coating on CNC tools. The single-layer titanium nitride coating is golden yellow, Vickers hardness is about 2300hv, and the maximum service temperature is 500 ℃. It is a kind of high cost-effective coating widely used in CNC tools.

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Tungsten Sputtering Targets

Tungsten(W) has excellent strength and hardness, and can maintain these properties even at extremely high temperatures, which is very rare in metals.

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Chromium Silicon Sputtering Target

Other products with different proportion of ingredients can be customized

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Chromium Aluminum Silicon

Other products with different proportion of ingredients can be customized

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Chromium Sputtering Targets

Thanks to its excellent corrosion resistance and wear resistance, the hard material coatings chromium(Cr) is widely used in combustion equipment and high-temperature fuel cells. Furthermore, our chromium is also used in appliances and jewelry. Because it gives them an attractive sheen when used as a decorative coating.

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Titanium-Silicon Sputtering Targets

If we combine titanium and silicon together, they are becoming wear resistant even when the temperatures are high. This is because the former ensures remarkably tough coatings and the latter guarantees high resistance to oxidation.

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CrAl Sputtering Target

Thanks to the toughness, high thermal stability and resistance to oxidation, our chromium-aluminum (CrAl) targets are widely used as the coatings of milling machines, drills and other tools.

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TiAl Targets

Our titanium-aluminum(TiAl) targets are used for decorative coatings on electronic devices. In addition, thanks to the resistance to oxidation and toughness, our titanium-aluminum targets are also widely used as the coatings of milling machines, drills and other tools.

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Ceramic Sputtering Targets

Why Customers Choose Advanced Targets
High-purity sputtering targets and High-density sputtering targets: Our metal sputtering targets are produced with the highest material purity, ensuring reliable and consistent results in every coating application.
Tailored Solutions: We offer Custom sputtering targets for sale to meet the specific needs of various industries, from automotive coatings to luxury finishes.
Efficient Production and On-Time Delivery: We ensure fast turnaround times and on-time delivery to help you meet your production deadlines without compromising on quality.
Sustainability Focus: Our eco-friendly production methods help reduce environmental impact while maintaining the high performance of our sputtering targets.