Graphite Target

Graphite Target has the characteristics of high temperature resistance, self lubrication, corrosion resistance and good conductivity. When graphite is used as target material, graphite materials of different materials are selected according to different industries.

DESCRIPTION

Graphite Target

Graphite (C) sputtering targets are widely used in the Physical Vapor Deposition (PVD) process for depositing thin carbon films onto substrates. Graphite targets are characterized by high temperature resistance, self-lubrication, corrosion resistance, and good electrical conductivity. When using graphite as a target material, different materials are used depending on the industry.

The sputtering process involves bombarding a target with high-energy plasma ions, which strips atoms from the surface of the target and deposits them on the substrate to form a thin film. Graphite sputtering targets are made from high-purity graphite material and come in a variety of shapes and sizes, such as discs, rectangular tiles and custom shapes.

Graphite sputtering targets are very durable and provide consistent, high quality films in the PVD process. They offer excellent thermal and electrical conductivity, good adhesion to the substrate, and high hardness for use in high-temperature, high-pressure environments.

Graphite Target

Advantage 

--Good processability

--Compared with metal materials, graphite has lower density and excellent machinability.

--Thermal stability
--Under the protection of inert gas, he can work at 3000 degrees or higher.

--Low expansion rate

Even in the case of rapid temperature rise, low thermal expansion can keep the graphite size unchanged.

---Good chemical resistance
At room temperature, graphite has good chemical stability such as acid resistance, alkali resistance and organic solvent resistance.

--Good electrical and thermal conductivity
Because of its good thermal conductivity, graphite is an ideal material for some applications, such as heating elements.

Graphite (C) Sputtering Target Applications

Graphite (C) sputtering target is mainly used in electronic information industry, glass coating field, wear-resistant materials, high temperature corrosion resistance, high-grade decorative articles and other industries.

Graphite (C) Sputtering Target Specifications

Shape: disk/rectangle/tube

Bonding: Unbonded/bonded

According to your requirements or drawings

We can customize as needed

Purity(%)>99.99(trace metal basis)
Color/AppearanceBlack,Non-Metallic
Thermal Conductivity140 W/m.K
Melting Point(O~3,652
Coefficient of Thermal Expansion7.1x10^-6/K
Theoretical Density (g/cm3)2.25
Z Ratio3.26
SputterPDC
Max Power Density
(Watts/Square  Inch)
80
Type of BondCopper
CommentsE-beam preferred.Arc evaporation.Poor film adhesion

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