Evaparation Materials
Advanced Targets also serve many customers who utilize evaporation techniques to deposit thin films.
DESCRIPTION
Advanced Targets also serve many customers who utilize evaporation techniques to deposit thin films. The range of materials offered is extensive, including pure metals, precious metals, standard alloys, oxides, nitrides, and fluorides. The materials can be packaged for the small quantity user, as well as, for the large volume production customer.
Shapes include Pellets, Pieces, Canes, Clips, Wires, and Foils.
Avaliable Materials
Titanium, Ziconium, Copper, Aluminium, Nb2O5, Ta2O5,TiOx, ITO
RELATED PRODUCTS
Indium tin oxide (ITO) is a solid solution of indium oxide (In2O3) and tin oxide (SnO2), typically 90% In2O3, 10% SnO2 by weight.ITO is one of the most widely used transparent conductive oxides because of its electrical conductivity and optical transparency.
Tungsten carbide is a compound composed of tungsten and carbon. Its molecular formula is WC and its molecular weight is 195.85.
Graphite Target has the characteristics of high temperature resistance, self lubrication, corrosion resistance and good conductivity. When graphite is used as target material, graphite materials of different materials are selected according to different industries.
Tantalum(Ta) is one of the rare, hard, blue gray, and highly corrosion-resistant refractory metals. The melting point of tantalum is 2980 ℃, and the density is 16.68g/cm³.
Molybdenum Alloy Sputtering Targets
Because molybdenum(Mo) alloy has higher recrystallization temperature, better creep resistance, higher ductility, higher weldability and better resistance to oxidation than the pure molybdenum, molybdenum-based alloy targets are more widely used in high-temperature applications
