Premium Chromium Sputtering Targets for corrosion-resistant PVD coatings. 99.5%-99.95% purity, HIP/HP technology, customizable solutions. Ideal for automotive, photovoltaic, and decorative industries. Trusted quality with ISO-certified production.
DESCRIPTION
Chromium sputtering targets are widely used in the Physical Vapor Deposition (PVD) process to create thin, high-quality coatings. Chromium (Cr) is a transition metal known for its hardness, corrosion resistance and excellent adhesion. Chromium is used in many vacuum applications such as automotive glass coatings, photovoltaic cell manufacturing, battery manufacturing as well as decorative and corrosion resistant coatings.
We supply high purity Cr coatings targets with guaranteed purity because we produce our chromium targets from the chromium powder to the finished product ourselves. And our targets have homogenous microstructure.
We supply planar and rotary chromium sputtering targets with the Hot Isostatic Pressing (HIP) and Hot Pressing (HP) technologies.
We supply chromium targets with purity of 99.5%-99.95%. Furthermore, we accept customized chromium targets.
(1)Smooth surface without pore,scratch and other imperfection
(2)Grinding or lathing edge, no cutting marks
(3) Unbeatable lerel of material purity
(4) High ductility
(5)Homogeneous micro trucalture
(6)Laser marking for your special ltem with name, brand, purity size and so on
(7)Every pcs of sputtering targets from the powder materials item&number, mixing workers,outgas and HlP time,machining
person and packing details are all made ourselves.
All of those step can promise you once a new sputtering target or method is created ,it could be copied and kept to support a stabel quality products.
1. Material composition and performance customization
Alloy ratio optimization
Adjust the element ratio according to the customer's coating performance requirements (such as CrAl target Al content 5%-40% adjustable)
Special needs: Add rare earth elements (Y, La, etc.) to improve high-temperature oxidation resistance
Purity grade selection
Standard purity: 99.5% (industrial grade coating)
High purity: 99.95%-99.999% (semiconductor/optical coating)
Grain structure control
Directed crystallization (<100>/<110> orientation) optimizes sputtering rate
Nanocrystalline structure (grain size 50-200nm) improves coating density
Typical applications: semiconductor wafer metallization layer, tool superhard coating, flexible circuit conductive layer
2. Geometric dimensions and connection design
Non-scale inch processing
Diameter range: φ50mm-φ500mm (supports rectangular/annular/tubular special-shaped parts)
Thickness tolerance: ±0.05mm (needed to cooperate with backplane welding)
Backplane integration solution
Material options: oxygen-free copper (OFHC)/molybdenum/stainless steel
Welding process: vacuum brazing (below 800℃), electron beam welding
Cooling structure design
Built-in water cooling channel (suitable for high-power magnetron sputtering)
Multi-layer gradient structure (reduce the risk of thermal stress cracking)
Customer case: Customized φ320mm for a photovoltaic company Cr/Al stacked target, sputtering efficiency increased by 37%
3. Surface treatment and packaging specifications
Surface finishing level
Conventional level: Ra≤0.8μm (direct supply by machining)
Mirror level: Ra≤0.1μm (special for optical coating)
Anti-oxidation treatment
Vacuum packaging (oxygen content <10ppm)
Inert gas filling (Ar/N2 double composite protection)
Item | 2N5 | 2N8 | 3N | 3N5 | |
Cr (wt%) | ≥99.5% | ≥99.8% | ≥99.9% | ≥99.95% | |
Others no more (ppm) <= | C | 200 | 400 | 150 | 100 |
N | 500 | 200 | 100 | 100 | |
0 | 1500 | 1000 | 500 | 300 | |
S | 100 | 100 | 50 | 50 | |
Fe | 1600 | 800 | 500 | 150 | |
A1 | 1200 | 500 | 200 | 100 | |
Si | 2000 | 600 | 300 | 100 | |
Ni | - | - | - | 50 | |
Cu | - | - | - | 50 | |
Mn | - | - | - | 50 |
High density
Uniform and fine grained micro structure
Homogeneous concerning distribution of chemical elements
Low content of residual impurities
(1) In cutting tools coating, Such as cutting and drawing tools, various materials of pressing mold and mold, bearing, shaft, gauge, gear, etc.
(2) Protection and decoration of automobile, bicycle, sewing machine, clock, instrument, daily hardware and other parts.
(3) Storage of lubricating media, prevent non lubrication operation, improve the anti friction and wear resistance of workpiece surface. It is often used to coat the surface of sliding friction parts under heavy pressure, such as internal combustion engine cylinder bore, piston ring, etc.
(4) It has uniform luster, good decoration and good extinction:
Protection and decoration of parts and components of aviation instrument and optical instrument, solar absorption panel and daily necessities.
RELATED PRODUCTS
Thanks to the toughness, high thermal stability and resistance to oxidation, our chromium-aluminum (CrAl) targets are widely used as the coatings of milling machines, drills and other tools.
Our titanium-aluminum(TiAl) targets are used for decorative coatings on electronic devices. In addition, thanks to the resistance to oxidation and toughness, our titanium-aluminum targets are also widely used as the coatings of milling machines, drills and other tools.
Premium Chromium Sputtering Targets for corrosion-resistant PVD coatings. 99.5%-99.95% purity, HIP/HP technology, customizable solutions. Ideal for automotive, photovoltaic, and decorative industries. Trusted quality with ISO-certified production.
Tungsten carbide is a compound composed of tungsten and carbon. Its molecular formula is WC and its molecular weight is 195.85.
Graphite Target has the characteristics of high temperature resistance, self lubrication, corrosion resistance and good conductivity. When graphite is used as target material, graphite materials of different materials are selected according to different industries.
Molybdenum Alloy Sputtering Targets
Because molybdenum(Mo) alloy has higher recrystallization temperature, better creep resistance, higher ductility, higher weldability and better resistance to oxidation than the pure molybdenum, molybdenum-based alloy targets are more widely used in high-temperature applications
Niobium(Nb) is a silver gray, rare, soft, and ductile transition metal. The purity of niobium targets can reach over 99.95%, with small grain size, good recrystallization structure, and good triaxial consistency.