Chromium Sputtering Targets

Premium Chromium Sputtering Targets for corrosion-resistant PVD coatings. 99.5%-99.95% purity, HIP/HP technology, customizable solutions. Ideal for automotive, photovoltaic, and decorative industries. Trusted quality with ISO-certified production.

DESCRIPTION

Chromium Sputtering Targets

Chromium sputtering targets are widely used in the Physical Vapor Deposition (PVD) process to create thin, high-quality coatings. Chromium (Cr) is a transition metal known for its hardness, corrosion resistance and excellent adhesion. Chromium is used in many vacuum applications such as automotive glass coatings, photovoltaic cell manufacturing, battery manufacturing as well as decorative and corrosion resistant coatings.


We supply high purity Cr coatings targets with guaranteed purity because we produce our chromium targets from the chromium powder to the finished product ourselves. And our targets have homogenous microstructure.
We supply planar and rotary chromium sputtering targets with the Hot Isostatic Pressing (HIP) and Hot Pressing (HP) technologies.
We supply chromium targets with purity of 99.5%-99.95%. Furthermore, we accept customized chromium targets.

Advantage

(1)Smooth surface without pore,scratch and other imperfection

(2)Grinding or lathing edge, no cutting marks

(3) Unbeatable lerel of material purity

(4) High ductility

(5)Homogeneous micro trucalture

(6)Laser marking for your special ltem with name, brand, purity size and so on

(7)Every pcs of sputtering targets from the powder materials item&number, mixing workers,outgas and HlP time,machining

person and packing details are all made ourselves.

All of those step can promise you once a new sputtering target or method is created ,it could be copied and kept to support a stabel quality products.

Chromium Sputtering Targets

Customized sputtering target service | Precisely match your PVD coating needs

1. Material composition and performance customization

Alloy ratio optimization

Adjust the element ratio according to the customer's coating performance requirements (such as CrAl target Al content 5%-40% adjustable)

Special needs: Add rare earth elements (Y, La, etc.) to improve high-temperature oxidation resistance

Purity grade selection

Standard purity: 99.5% (industrial grade coating)

High purity: 99.95%-99.999% (semiconductor/optical coating)

Grain structure control

Directed crystallization (<100>/<110> orientation) optimizes sputtering rate

Nanocrystalline structure (grain size 50-200nm) improves coating density

Typical applications: semiconductor wafer metallization layer, tool superhard coating, flexible circuit conductive layer

2. Geometric dimensions and connection design

Non-scale inch processing

Diameter range: φ50mm-φ500mm (supports rectangular/annular/tubular special-shaped parts)

Thickness tolerance: ±0.05mm (needed to cooperate with backplane welding)

Backplane integration solution

Material options: oxygen-free copper (OFHC)/molybdenum/stainless steel

Welding process: vacuum brazing (below 800℃), electron beam welding

Cooling structure design

Built-in water cooling channel (suitable for high-power magnetron sputtering)

Multi-layer gradient structure (reduce the risk of thermal stress cracking)

Customer case: Customized φ320mm for a photovoltaic company Cr/Al stacked target, sputtering efficiency increased by 37%

3. Surface treatment and packaging specifications

Surface finishing level

Conventional level: Ra≤0.8μm (direct supply by machining)

Mirror level: Ra≤0.1μm (special for optical coating)

Anti-oxidation treatment

Vacuum packaging (oxygen content <10ppm)

Inert gas filling (Ar/N2 double composite protection)

Specification

Item2N52N83N3N5
Cr (wt%)≥99.5%≥99.8%≥99.9%≥99.95%
Others
no more
(ppm)
<=
C200400150100
N500200100100
015001000500300
S1001005050
Fe1600800500150
A11200500200100
Si2000600300100
Ni---50
Cu---50
Mn---50


Chromium Sputtering Targets

Features

High density
Uniform and fine grained micro structure
Homogeneous concerning distribution of chemical elements
Low content of residual impurities

Our Certifications

ISO 9001:2015&Patent Certificate

Chromium Sputtering Targets

Chromium Sputtering Targets


Popular Usage

(1) In cutting tools coating, Such as cutting and drawing tools, various materials of pressing mold and mold, bearing, shaft, gauge, gear, etc.

(2) Protection and decoration of automobile, bicycle, sewing machine, clock, instrument, daily hardware and other parts.

(3) Storage of lubricating media, prevent non lubrication operation, improve the anti friction and wear resistance of workpiece surface. It is often used to coat the surface of sliding friction parts under heavy pressure, such as internal combustion engine cylinder bore, piston ring, etc.

(4) It has uniform luster, good decoration and good extinction:
Protection and decoration of parts and components of aviation instrument and optical instrument, solar absorption panel and daily necessities.

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