AZO Sputtering Targets
According to the chemical components, the ceramic targets can be divided into: Oxide-ceramic targets, Silicide-ceramic targets, Nitride-ceramic targets, Fluoride-ceramic targets and Sulfide-ceramic targets.
DESCRIPTION
According to the chemical components, the ceramic targets can be divided into: Oxide-ceramic targets, Silicide-ceramic targets, Nitride-ceramic targets, Fluoride-ceramic targets and Sulfide-ceramic targets. Our ceramic targets(including AZO, ITO, GZO, Si, SiAl, TiOx, ZnS, CdS, WC) are widely used in microelectronic semiconductor integrated circuits, thin film hybrid integrated circuits and chip components especially CD, disk and LCD flat panel display.
We can supply ceramic targets with excellent purity, high density and fine-grained microstructure.
RELATED PRODUCTS
Advanced Targets also serve many customers who utilize evaporation techniques to deposit thin films.
Tungsten carbide is a compound composed of tungsten and carbon. Its molecular formula is WC and its molecular weight is 195.85.
Graphite Target has the characteristics of high temperature resistance, self lubrication, corrosion resistance and good conductivity. When graphite is used as target material, graphite materials of different materials are selected according to different industries.
Tantalum(Ta) is one of the rare, hard, blue gray, and highly corrosion-resistant refractory metals. The melting point of tantalum is 2980 ℃, and the density is 16.68g/cm³.
Molybdenum Alloy Sputtering Targets
Because molybdenum(Mo) alloy has higher recrystallization temperature, better creep resistance, higher ductility, higher weldability and better resistance to oxidation than the pure molybdenum, molybdenum-based alloy targets are more widely used in high-temperature applications
