Production and purification of aluminum Aluminum is obtained by extracting alumina from bauxite and then electrolysis in molten cryolite.
DESCRIPTION
Product Name | Aluminum (al)sputtering target |
Available Purity(%) | 99.5%, 99.8%, 99.9%, 99.95%, 99.99% 99.999% |
Shape: | Plate, round, rotary, pipe/tube |
Size | OEM size |
Melting point(℃) | 660(℃) |
boiling point | 2500(℃) |
Density(g/cm³) | 2.7g/cm³ |
Compressibility | 13.3mm2/MN |
Lattice energy | 200*10-7 |
Elastic modulus | 66.6Gpa |
shear modulus | 25.5Gpa |
Application: | It is suitable for DC two pole sputtering, three pole sputtering, four stage sputtering, RF sputtering, target sputtering, ionbeam sputtering, magnetron sputtering, etc. it can be used for plating reflective film, conductive film, semiconductor filmcapacitor film, decorative film, protective film, integrated circuit, display, etc. compared with other targets, the price of aluminum target is lower, sothe aluminum target is before it can meet the function of the film The first choice of targetmaterials. |
Popular Usage
1. Production and purification of aluminum Aluminum is obtained by extracting alumina from bauxite and then electrolysis in molten cryolite. The purity is generally above 99%. However, aluminum with such purity can not be used as raw material for producing aluminum target. The first and most important requirement for aluminum target is high purity. The high purity aluminum used for aluminum target is through segregation, three-layer electrolysis or combined zone smelting The price of the product is much higher than that of industrial pure aluminum 99.7, and the highest purity in China is about 99.9999% (6N).
2. Deformation treatment of aluminum target: with high purity aluminum ingot as raw material, forging, rolling and heat treatment are carried out on the raw material to make the grains in the aluminum ingot smaller and the density increased, so as to meet the requirements of aluminum target for sputtering.
3. The high-purity aluminum material after deformation treatment is machined. The aluminum target requires high precision and high surface quality. It can be machined into the target size required by the vacuum coating machine. The aluminum target and the coating machine are mostly connected by threads.
RELATED PRODUCTS
Graphite Target has the characteristics of high temperature resistance, self lubrication, corrosion resistance and good conductivity. When graphite is used as target material, graphite materials of different materials are selected according to different industries.
Tantalum(Ta) is one of the rare, hard, blue gray, and highly corrosion-resistant refractory metals. The melting point of tantalum is 2980 ℃, and the density is 16.68g/cm³.
Molybdenum Alloy Sputtering Targets
Because molybdenum(Mo) alloy has higher recrystallization temperature, better creep resistance, higher ductility, higher weldability and better resistance to oxidation than the pure molybdenum, molybdenum-based alloy targets are more widely used in high-temperature applications
Our titanium-aluminum(TiAl) targets are used for decorative coatings on electronic devices. In addition, thanks to the resistance to oxidation and toughness, our titanium-aluminum targets are also widely used as the coatings of milling machines, drills and other tools.
Tungsten(W) has excellent strength and hardness, and can maintain these properties even at extremely high temperatures, which is very rare in metals.
Chromium Silicon Sputtering Target
Other products with different proportion of ingredients can be customized
Other products with different proportion of ingredients can be customized